Microstructure of titanium films formed by induction PVD on alumina ceramics
In this work, the microstructure of the layers formed on alumina ceramics by vacuum sputtering was investigated. In the process of obtaining titanium layers, induction heating was used to sputter a tubular target. The studies were carried out by the method of scanning electron microscopy (SEM) with energy dispersive X-ray analysis (EDX) of the chemical composition. It was found that in the process of sputtering, a titanium film with a thickness of up to 1–2 µm, consisting of rounded particles up to 150 nm in size, was formed on the ceramic substrate.
Fomin Aleksander Aleksandrovich
Yuri Gagarin State Technical University of Saratov
File with report